—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
— Determination of maximum operating frequencies (Fmax) during manufacturing test at different operating voltages is required to: (a) to ensure that, for a Dynamic Voltage and Fr...
— One of the critical goals in code optimization for MPSoC architectures is to minimize the number of off-chip memory accesses. This is because such accesses can be extremely cos...
This paper presents the Routing Cost Valleys (RCV) algorithm – the first published algorithm that simultaneously optimizes all short- and long-path timing constraints in a Field...
—In the past ten years, computer architecture has seen a paradigm shift from emphasizing single thread performance to energy efficient, throughput oriented, chip multiprocessors...
David Nellans, Kshitij Sudan, Rajeev Balasubramoni...