Functional symmetries provide significant benefits for multiple tasks in synthesis and verification. Many applications require the manual specification of symmetries using spe...
Guoqiang Wang, Andreas Kuehlmann, Alberto L. Sangi...
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
Methods based on Boolean satisfiability (SAT) typically use a Conjunctive Normal Form (CNF) representation of the Boolean formula, and exploit the structure of the given problem ...
Concept maps are an important tool to knowledge organization, representation, and sharing. Most current concept map tools do not provide full support for hand-drawn concept map cr...
Many applications need to segment out all small round
regions in an image. This task of finding dots can be viewed
as a region segmentation problem where the dots form one
regio...