We introduce a new EM framework in which it is possible not only to optimize the model parameters but also the number of model components. A key feature of our approach is that we...
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
We propose a new paradigm for building scalable distributed systems. Our approach does not require dealing with message-passing protocols—a major complication in existing distri...
Marcos Kawazoe Aguilera, Arif Merchant, Mehul A. S...
Based on multifractal analysis in wavelet pyramids of texture images, a new texture descriptor is proposed in this paper that implicitly combines information from both spatial and...
Word-based compression over natural language text has shown to be a good choice to trade compression ratio and speed, obtaining compression ratios close to 30% and very fast decom...