We present a new approach for modeling and rendering existing architectural scenes from a sparse set of still photographs. Our modeling approach, which combines both geometry-base...
Paul E. Debevec, Camillo J. Taylor, Jitendra Malik
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
—Software developers often face challenges in reusing open source frameworks due to several factors such as the framework complexity and lack of proper documentation. In this pap...
Current change history analysis approaches rely on information provided by versioning systems such as CVS. Therefore, changes are not related to particular source code entities su...
In this paper, we propose an algorithm to construct the Ordered Binary Decision Diagram (OBDD) representing the cut function of a terminal-pair network. The algorithm recognizes i...